半导体制造的常用名词

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2024年6月22日发(作者：)

半导体制造的常用名词

发表于: 2007-5-07 17:10 作者: luhaoxinglhx 来源: 半导体技术天地

Ingot - A cylindrical solid made of polycrystalline or single crystal silicon from which wafers are cut.

晶锭 - 由多晶或单晶形成的圆柱体，晶圆片由此切割而成。

Laser Light-Scattering Event - A signal pulse that locates surface imperfections on a wafer.

激光散射 - 由晶圆片表面缺陷引起的脉冲信号。

Lay - The main direction of surface texture on a wafer.

层 - 晶圆片表面结构的主要方向。

Light Point Defect (LPD) (Not preferred; see localized light-scatterer)

光点缺陷(LPD) （不推荐使用，参见“局部光散射”）

Lithography - The process used to transfer patterns onto wafers.

光刻 - 从掩膜到圆片转移的过程。

Localized Light-Scatterer - One feature on the surface of a wafer, such as a pit or a scratch that scatters

light. It is also called a light point defect.

局部光散射 - 晶圆片表面特征，例如小坑或擦伤导致光线散射，也称为光点缺陷。

Lot - Wafers of similar sizes and characteristics placed together in a shipment.

批次 - 具有相似尺寸和特性的晶圆片一并放置在一个载片器内。

Majority Carrier - A carrier, either a hole or an electron that is dominant in a specific region, such as

electrons in an N-Type area.

多数载流子 - 一种载流子，在半导体材料中起支配作用的空穴或电子，例如在N型中是电子。

Mechanical Test Wafer - A silicon wafer used for testing purposes.

机械测试晶圆片 - 用于测试的晶圆片。

Microroughness - Surface roughness with spacing between the impurities with a measurement of less

than 100 μm.

微粗糙 - 小于100微米的表面粗糙部分。

Miller Indices, of a Crystallographic Plane - A system that utilizes three numbers to identify plan

orientation in a crystal.

Miller索指数 - 三个整数，用于确定某个并行面。这些整数是来自相同系统的基本向量。

Minimal Conditions or Dimensions - The allowable conditions for determining whether or not a wafer is

considered acceptable.

最小条件或方向 - 确定晶圆片是否合格的允许条件。

Minority Carrier - A carrier, either a hole or an electron that is not dominant in a specific region, such as

electrons in a P-Type area.

少数载流子 - 在半导体材料中不起支配作用的移动电荷，在P型中是电子，在N型中是空穴。

Mound - A raised defect on the surface of a wafer measuring more than 0.25 mm.

堆垛 - 晶圆片表面超过0.25毫米的缺陷。

Notch - An indent on the edge of a wafer used for orientation purposes.

凹槽 - 晶圆片边缘上用于晶向定位的小凹槽。

Orange Peel - A roughened surface that is visible to the unaided eye.

桔皮 - 可以用肉眼看到的粗糙表面

Orthogonal Misorientation -

直角定向误差 -

Particle - A small piece of material found on a wafer that is not connected with it.

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颗粒 - 晶圆片上的细小物质。

Particle Counting - Wafers that are used to test tools for particle contamination.

颗粒计算 - 用来测试晶圆片颗粒污染的测试工具。

Particulate Contamination - Particles found on the surface of a wafer. They appear as bright points when

a collineated light is shined on the wafer.

颗粒污染 - 晶圆片表面的颗粒。

Pit - A non-removable imperfection found on the surface of a wafer.

深坑 - 一种晶圆片表面无法消除的缺陷。

Point Defect - A crystal defect that is an impurity, such as a lattice vacancy or an interstitial atom.

点缺陷 - 不纯净的晶缺陷，例如格子空缺或原子空隙。

Preferential Etch -

优先蚀刻 -

Premium Wafer - A wafer that can be used for particle counting, measuring pattern resolution in the

photolithography process, and metal contamination monitoring. This wafer has very strict specifications

for a specific usage, but looser specifications than the prime wafer.

测试晶圆片 - 影印过程中用于颗粒计算、测量溶解度和检测金属污染的晶圆片。对于具体应用该晶圆片有

严格的要求，但是要比主晶圆片要求宽松些。

Primary Orientation Flat - The longest flat found on the wafer.

主定位边 - 晶圆片上最长的定位边。

Process Test Wafer - A wafer that can be used for processes as well as area cleanliness.

加工测试晶圆片 - 用于区域清洁过程中的晶圆片。

Profilometer - A tool that is used for measuring surface topography.

表面形貌剂 - 一种用来测量晶圆片表面形貌的工具。

Resistivity (Electrical) - The amount of difficulty that charged carriers have in moving throughout material.

电阻率（电学方面） - 材料反抗或对抗电荷在其中通过的一种物理特性。

Required - The minimum specifications needed by the customer when ordering wafers.

必需 - 订购晶圆片时客户必须达到的最小规格。

Roughness - The texture found on the surface of the wafer that is spaced very closely together.

粗糙度 - 晶圆片表面间隙很小的纹理。

Saw Marks - Surface irregularities

锯痕 - 表面不规则。

Scan Direction - In the flatness calculation, the direction of the subsites.

扫描方向 - 平整度测量中，局部平面的方向。

Scanner Site Flatness -

局部平整度扫描仪 -

Scratch - A mark that is found on the wafer surface.

擦伤 - 晶圆片表面的痕迹。

Secondary Flat - A flat that is smaller than the primary orientation flat. The position of this flat determines

what type the wafer is, and also the orientation of the wafer.

第二定位边 - 比主定位边小的定位边，它的位置决定了晶圆片的类型和晶向。

Shape -

形状 -

Site - An area on the front surface of the wafer that has sides parallel and perpendicular to the primary

orientation flat. (This area is rectangular in shape)

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